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INVENTION
Patent of the Russian Federation RU2260634
SOLUTION FOR CHEMICAL POLISHING OF TITANE
Name of the applicant: State Educational Establishment of Higher Professional Education "Ivanovo State University of Chemical Technology" (SEIHI "IGHTU") (RU)
The name of the inventor: Dontsov M.G.
(RU); Kotov V.L. (RU); Nevsky OI (RU); Balmasov A.V. (RU)
The name of the patent holder: State Educational Establishment of Higher Professional Education "Ivanovo State University of Chemical Technology" (GOUVPO "IGHTU") (RU)
Address for correspondence: 153460, Ivanovo, F. Engels av., 7, VPOI "IGHTU", patent department
Date of commencement of the patent: 2004.07.12
The invention relates to the field of chemical polishing of metals and can be used for pretreatment of the surface of titanium articles before ion-plasma spraying of a layer of titanium nitride in the manufacture of compressor blades for the gas and aviation industries, for imparting a decorative appearance to products in the jewelry industry, Before applying metal coatings. The solution contains an oxidizing agent, a fluorine-containing compound and water, with hydroxylamine sulfate [(NH 2 OH) 2 · H 2 SO 4 ] or hydroxylamine hydrochloric acid [NH 2 OH · HCl] as an oxidizing agent, and as a fluorine-containing compound, ammonium fluoride is acidic [ NH 4 F · HF] or an acidic fluorine-containing alkali metal salt: potassium fluoride acid [KF · HF] or sodium fluoride acid [NaF · HF], with the following component ratio, g / l: hydroxylamine sulfate or hydroxylamine hydrochloric acid 200-250, fluorine-containing Compound 60-80, water up to 1 liter. The invention makes it possible to: reduce the removal of metal by 2-3 times, increase the working capacity of the solution during polishing by more than 1.5 times, increase the relative degree of smoothing by 10-14%.
DESCRIPTION OF THE INVENTION
Chemical polishing of titanium is used as a preliminary surface treatment before ion-plasma spraying of a layer of titanium nitride in the manufacture of compressor blades for the gas and aviation industries, for giving a decorative look to products in the jewelry industry, and when preparing the surface before applying metal coatings.
A solution is known for chemical polishing of titanium by immersion in a polishing solution containing HNO 3 , HF, H 2 O 2 and H 3 PO 4, or a solution additionally saturated with a NH 4 F · HF or NaF · HF salt [Pat. Japan Watanabe Norikazu. Chemical polishing of titanium and its alloys, cl. 12 JSC, (from 09 to 13/08), № 50-8689, the announcement. 2.10.69., Publ. 07.04.75].
The disadvantages of the analogue are: complex solution composition, high aggressiveness and difficulty of its correction.
A solution for chemical polishing of titanium is known by immersion in a polishing solution containing H 2 SO 4 -400 ml / l, HF-200 ml / l, HNO 3 -400 ml / l, treatment time 1-2 minutes at a temperature of 80-90 ° C [Yampolsky Ya.M., Ilyin V.A. Quick reference electroplating. 3rd ed., Revised. And additional. L: Mechanical Engineering, 1981.].
The disadvantages of the analogue are: high aggressiveness of the solution and the difficulty of its adjustment.
A solution for chemical polishing of titanium is known by immersion in a polishing solution containing (in vol%) H 2 SiF 6 -33, HF-8, HNO 3 -25, H 3 PO 4 -17, CH 3 COOH-17, 15-90 min, temperature 20 ° C (US Pat. Missel Leo. Chemical polishing of titanium and its alloys, cl. 255-79.3 (C 23 F 3/4) No. 3514407, filed on September 28, 1966, published on 26.0570] .
The disadvantages of the analogue are: complex composition of the solution, high aggressiveness, difficulty in adjusting it, and long-term processing.
The closest to the claimed invention, i.e. Prototype, is a solution for chemical polishing of titanium by immersion in a polishing solution containing H 2 O 2 (30%) 600 ml / l, HF (40th) 80-100 ml / l, the rest water, 60 s [Lipkin Ya.N., Bershadskaya Т.М. Chemical polishing of metals. M: Mechanical engineering, 1988] . After treatment of titanium VT1-0 in solution at a temperature of 80-90 ° C for 30-60 s, the relative degree of smoothing is 50-66%, with an initial roughness value of Ra = 0.650 μm, a gloss level of 24-46%, a 35- 75 microns. Under these conditions, the working capacity of the solution is 2-4 dm 2 / l.
The disadvantages of the prototype are:
- large metal removal
- low working capacity of the polishing solution due to the rapid consumption of hydrogen peroxide during polishing.
SUMMARY OF THE INVENTION
The inventive task was to develop a solution for chemical polishing of titanium, which would reduce the removal of metal and increase the efficiency of the polishing solution while maintaining the quality of the surface of the parts after polishing.
The objective is achieved by developing a solution for chemical polishing of titanium containing an oxidant, a fluorine-containing compound and water which contains hydroxylamine sulfate [(NH 2 OH) 2 · H 2 SO 4 ] or hydroxylamine hydrochloric acid [NH 2 OH · HCl] as the oxidant, and As the fluorine-containing compound, ammonium fluoride is acidic [NH 4 F · HF] or an acidic fluorine-containing alkali metal salt: potassium fluoride acid [KF-HF] or sodium fluoride acid [NaF · HF], with the following component ratio, g / l:
Information confirming the possibility of implementing the invention.
To implement the chemical polishing of titanium by immersion in solution, the following substances are used:
Example 1. To prepare 1 liter of a solution for polishing titanium 200 g of hydroxylamine sulfate and 60 g of ammonium fluoride must be dissolved in 600 ml of distilled water at a temperature of 60-70 ° C and brought to 1 liter with water.
Example 2. To prepare 1 liter of a solution for polishing titanium, 225 g of hydroxylamine hydrochloric acid and 70 g of sodium fluoride must be dissolved in 600 ml of distilled water at a temperature of 60-70 ° C and brought to 1 liter with water.
Example 3. To prepare 1 liter of a solution for polishing titanium, 250 g of hydroxylamine hydrochloric acid and 80 g of potassium fluoride should be dissolved in 600 ml of distilled water at a temperature of 60-70 ° C and brought to 1 liter with water.
The chemical polishing of titanium VT 1-0 is realized by immersion in a polishing solution with stirring of a solution or by rocking titanium parts at a temperature of 80-90 ° C for 60-90 s, followed by a rinse in cold water.
The removal of the metal was determined by the weight method, i.e. By weight of the sample mass with a known area and calculated by the formula:
Where h is the removal of metal μm, m is the mass of the dissolved metal, g, S is the sample surface to be treated, cm 2 , 
- density of titanium equal to 4.5 g / cm 2 ; Efficiency was determined by alternately processing 1 liter of the polishing solution of samples with an area of 1 dm 2 , followed by measuring the parameters of the polished surface (gloss level and relative degree of smoothing) and the solution was considered workable if the parameters of the polished surface differed from the parameters of the first processed sample by no more than 15 -20%; The gloss level was measured with a photoelectric FB-2 gloss photometer; The relative degree of smoothing was calculated by the formula:
Where Ra and Rh are the initial and final values of the roughness parameter, respectively, in microns, the roughness value was measured with a profilograph-profilometer "Caliber" -252.
Thus, it can be seen from the table that the invention makes it possible to: reduce the metal removal by 2-3 times, increase the working capacity of the solution during polishing by more than 1.5 times, increase the relative degree of smoothing by 10-14%.
CLAIM
A solution for chemical polishing of titanium comprising an oxidant, a fluorine-containing compound and water, characterized in that the oxidant contains hydroxylamine sulfuric acid or hydroxylamine hydrochloric acid, and as the fluorine-containing ammonium compound, an acidic fluoride or acidic fluorine-containing alkali metal salt, in the following ratio Components, g / l:
print version
Date of publication 03.01.2007gg
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